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Chemical Vapour Deposition Systems
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QrystalTM is a research grade chemical vapour deposition system, with 12 independent temperature zones, each capable of reaching temperatures upto 1150 °C. It has an inbuilt precision mass flow controller allowing controlled injection of upto 4 gases. A back pressure regulator allows a fixed controlled pressure to be maintained throughout the deposition chamber. Furnace : QBAKE-1100-3 Independent Heating Zones : 12 Maximum Temperature : 1150 °C for transient, 1100 °C for continuous operation Uniform Temperature Zone Length : 200 mm Temperature Uniformity : Better than ±5 °C within a zone Heater Wire Material : Kanthal Process Tube Material : Quartz Process Tube Diameter : ID = 45 mm, OD = 48 mm Embedded Temperature Sensor : K-type Thermocouple Temperature Controller : TCON-12 Sensor Channels : 16 Sensor Type : K-type Thermocouple (or PT100) Independent Control Loops : 12 Control Algorithm : Floating Point P-I-D Temperature Stability : Better than 0.1 °C PID Auto-tune : Yes Heater Drive : 220V, 50 Hz Vacuum System : VAC-10E-2 Pump Type : 2-stage, Rotary Pump Pump Throughput : 15 m3/hour Ultimate Vacuum : 10m-3 mBar Vacuum Sensor : Pirani Gauge and ±15 psi tube pressure sensor mounted at the end of the quartz tube Chamber Isolation : Butterfly Valve Mass Flow Controller : MF02 Number of Channels : 4 Channel 1, 2 : 0-1000 sccm Auxilliary Valves : 2/channel, one in series for true shutoff, one in parallel for flushing Flow Stability : Better than 0.1% of full scale
Chemical Vapor Deposition System
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