mask aligner
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FEATURES Wafer Size: up to 4” dia Economical, Compact & Hi-Level Performance Viewing fused image of two alignment marks in the field of view. Integrator lens for exposure. LED illuminator APPLICATIONS (Micromachine development in R&D center and university) Acuator, Pressure Sensor, Acceleration Sensor, Power Device, etc. Exposure for Flip Chip/BGA/CSP. Exposure for Optical/High Speed Communication Components.
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mask aligner
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The SUSS MicroTec Mask Aligner has become synonymous with superior quality, high alignment accuracy, and sophisticated exposure optics. SUSS MicroTec offers a complete range of mask aligners for high-end fab automation, high volume production and R&D environments alike. SUSS MicroTec designs their mask aligner systems for lithography applications in the field of 3D Packaging, Advanced Packaging, MEMS, LED, Compound Semiconductors, Power Devices, Photovoltaic, Nanotechnology and Wafer Level Optics.
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