NST 600-3HD Three Target Magnetron Sputtering Coater
950,000 - 2,500,000 Per Piece
1 Piece (MOQ)
600-3HD THREE-TARGET MAGNETRON SPUTTERING COATER is a newly developed coating equipment, which can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical Film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
Diffusion Coating Unit
3 Per Piece
We make sure that all our products are in compliance with the industry standards and thus cross checked at all stages including manufacturing, warehousing, packaging and final dispatch. Based in Chennai(India), our organization is involved for years in supplying the finest grade of Sputtering Turbo and Diffusion Coating Unit in the industry. Features : Precise design Fine finish Dimensional accuracy Price Range : Rs 300000 - Rs 40,00000
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HHVs magnetron sputtering system has been engineered for the mass production of electronic components such as electrical contacts, connectors, relays, thick film resistors, reed switches and sensors. The system has been design to deposit rare materials like Platinum (Pt), Palladium (Pd), Rhodium (Rh), Gold (Au) and Silver (Ag) to produce highly efficient, uniform thin films for even the most complex applications. Comprehensive SCADA-based vacuum and process control automation provides repeatable run-to-run operation. Process recipe selection is provided and the system can send out SMS messages in the event of needing attention. A cryo-based pumping system enables an ultimate vacuum of < 5x 10-7 mbar in the chamber.
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This is a custom designed chamber which is spherical or cylindrical as per requirement. System can be designed for parallel geometry or confocal geometry. Single layer, multilayer or co - sputtering systems as per user requirements. It consists of: Chamber Sputter sources for 1" or 2" or 3" dia targets
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