Fluoride sputtering target
10,000 - 35,000 Per piece
1 Piece (MOQ)
AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6, SrF2, ThF4, YF3, YbF3
Platinum Sputtering Target 55
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vrs laboratory is a highly reliable platinum sputtering target manufacturer and supplier in gujarat (india). The platinum sputtering target is made out of high purity platinum (99.99%) and the surface area is mirror polished so that you can even see reflections in it. The platinum sputtering target is also available in very pure silver metal and gold metal. Our platinum sputtering target is available at market leading prices.
Best Deals from Sputtering Target
Sputtering Target
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1 Kilogram (MOQ)
Planar targets made of silver with purity up to 99.99% and gold with purity up to 99.999% and of other precious metals upon customer’s request, including targets with steel inserts. Rotatable targets Ag, Zn, ZnAl, ZnSn. Bonded platinum targets based on copper. Bonded gold and Cr targets based on copper.
Platinum Sputtering Target
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We have installed all the requisite amenities, necessary for making safe side deliveries. Operating from Mumbai(India), we are instrumental in offering the wide array of products to the customers.
Nst 300-2hd Dual Target Magnetron Sputtering Coater
850,000 - 2,900,000 Per Piece
1 Piece (MOQ)
300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.
Lead Zirconate Titanate Nanowire
10 - 50 Per Pack
mf: pb(zrti)o3 chemical name: lead zirconate titanate nanowire purity: > 99.9% diameter: ~40nm length: up to 200µm form nanowires cas number 12626-81-2 .
titanium sputtering targets
1 Per 0
For pvd coating
Copper Sputtering Target
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Titanium Round Target
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sputtering targets
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HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics and specialty inorganic thin film PVD chemicals for a variety of target configurations. Forms include standard geometries likeCircular (2”~12”Dia), rectangular, cylindrical type, and rotary as well as custom designs for specialized processes.Target backing plateswith customised sizes and configurations can be provided with wide variety of materials including copper, aluminium, molybdenum and stainless steel.
sputtering targets
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1 Piece (MOQ)
All Types and sizes of Sputtering Targets. Price on enquiry. Purity up to 99.9999.
Sputtering Target
5,000 Per Piece
1 Piece(s) (MOQ)
high purity metal, alloy, ceramic, semiconductor and other customized sputter and pulsed laser deposition targets. Sputter targets are available with and without copper backing plate as required.targets can be customized in any dimensions.
Alumina Sputtering Target
1 - 2 Per Pack
01 Pack(s) (MOQ)
Sputtering Target
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1 Number (MOQ)
sputtering targets
10,000 Per Piece
1 Piece (MOQ)
sputtering targets
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Sputtering Target
17,000 Per Units
100 Units (MOQ)
sputtering targets
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We supply sputtering targets which is manufactured under show unparalleled outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure. The popular geometries featuring with both planar and rotatable shapes, such as circular, rectangular, ring, tube, cylinder and conicity, are all available. If you have your own unique requirements about the sputtering targets, no matter in density, purity, homogeneity or in geometry, please let us know exactly what you need. We'll do our utmost to meet your requirements precisely.
Metal and Alloy Sputtering Targets
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Shape: Ingot, Plate, Foil, Sheet, Disc, Ring, Rod, Wire, Tube, Granule, Pellet, Shots etc. Aluminum (Al) Target, Antimony (Sb) Target, Silver (Ag) Target Gold (Au) Target, Cerium (Ce) Target, Cobalt (Co) Target Carbon (C) Target, Chromium (Cr) Target, Copper (Cu) Target Cadmium (Cd) Target, Dysprosium (Dy) Target, Erbium(Er) Target Gadolinium (Gd) Target, Germanium (Ge) Target, Holmium (Ho) Target Hafnium (Hf) Target, Indium (In) Target, Iridium (Ir) Target Iron (Fe) Target, Lanthanum (La) Target, Lutetium (Lu) Target Lead (Pb) Target, Magnesium (Mg) Target, Molybdenum (Mo) Target Niobium (Nb) Target, Neodymium (Nd) Target, Nickel (Ni) Target Praseodymium (Pr) Target, Platinum (Pt) Target, Rhenium (Re) Target Ruthenium (Ru) Target, Scandium (Sc) Target, Silicon (Si) Target Samarium(Sm) Target, Tantalum (Ta) Target, Terbium (Tb) Target Titanium (Ti) Target, Thulium(Tm) Target, Tin (Sn) Target Vanadium (V) Target, Tungsten (W) Target, Ytterbium (Yb) Target Yttrium (Y) Target, Zirconium (Zr) Target, Zinc (Zn) Target
sputtering targets
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HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics...