Sputtering Target Dealers

(35 products available)
  • Fluoride sputtering target

    Fluoride sputtering target

    10,000 - 35,000 Per piece

    1 Piece (MOQ)

    • Material: Aluminum, Copper, Metal, Titanium
    • Finishing: Non Polished, Polished
    • Shape: Round
    • Color: Gold, Gray, Sliver, White
    • Purity: 99.9%
    • Packaging Type: Box
    • Type: Sputtering Target

    AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6, SrF2, ThF4, YF3, YbF3

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  • Platinum Sputtering Target 55

    Platinum Sputtering Target 55

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    vrs laboratory is a highly reliable platinum sputtering target manufacturer and supplier in gujarat (india). The platinum sputtering target is made out of high purity platinum (99.99%) and the surface area is mirror polished so that you can even see reflections in it. The platinum sputtering target is also available in very pure silver metal and gold metal. Our platinum sputtering target is available at market leading prices.

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  • Best Deals from Sputtering Target

  • Sputtering Target

    Sputtering Target

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    1 Kilogram (MOQ)

    • Purity: 99.995%
    • Material: Aluminum
    • Country of Origin: Russia
    • Usage/Application: Industrial Usage
    • Packaging: Wooden Box

    Planar targets made of silver with purity up to 99.99% and gold with purity up to 99.999% and of other precious metals upon customer’s request, including targets with steel inserts. Rotatable targets Ag, Zn, ZnAl, ZnSn. Bonded platinum targets based on copper. Bonded gold and Cr targets based on copper.

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  • Platinum Sputtering Target

    Platinum Sputtering Target

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    • Purity: 99.99%
    • Application: The Platinum Sputtering Target is use in semiconductor, physical vapour deposition, chemical vapour deposition and optical applications
    • Availability: Any diameter and thickness
    • CAS: 7440-06-4
    • Diameter: 50 mm ± 1mm
    • Diameter (mm): 50mm

    We have installed all the requisite amenities, necessary for making safe side deliveries. Operating from Mumbai(India), we are instrumental in offering the wide array of products to the customers.

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  • Nst 300-2hd Dual Target Magnetron Sputtering Coater

    Nst 300-2hd Dual Target Magnetron Sputtering Coater

    850,000 - 2,900,000 Per Piece

    1 Piece (MOQ)

    • Finishing: Polished
    • Feature: Easy To Use, Long Life, Strong Structure, Sturdiness
    • Type: Sputtering Target
    • Country of Origin: India
    • Model Number: 300-2HD
    • Power Supply Voltage: 220V, 50 Hz
    • Working Vacuum Degree: 10-4Pa
    • The Number of Target Guns: 1
    • RF Sputtering Power: 300W / 500W (Optional)

    300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.

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  • Lead Zirconate Titanate Nanowire

    Lead Zirconate Titanate Nanowire

    10 - 50 Per Pack

    • Brand Name: Nanochemazone
    • Brand Name: Nanochemazone

    mf:                             pb(zrti)o3 chemical name:      lead zirconate titanate nanowire purity:                        > 99.9% diameter:                  ~40nm length:                       up to 200µm form                           nanowires cas number             12626-81-2 .

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  • titanium sputtering targets

    titanium sputtering targets

    1 Per 0

    • Type: Sputtering Target
    • Material: Titanium
    • Shape: Round
    • Color: Gray
    • Purity: 99%
    • Finishing: Polished

    For pvd coating

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  • Copper Sputtering Target

    Copper Sputtering Target

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    • Purity: 99.99%
    • Shape: Discs, Plates, Column Targets, Tubing Targets, Custom-made
    • Appearance: Reddish Metal
    • Melting Point: 1085°C
    • Boiling Point: 2562°C
    • Density: 8.96 g/cm3
    • Electrical Resistivity: 1.673 μΩ-cm @ 20°C
    • Heat of Vaporization: 300.4 kJ·mol-1
    • Thermal Conductivity: 401 W·m-1·K-1
    • Thermal Expansion: (25 °C) 16.5 µm·m-1·K-1
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  • Titanium Round Target

    Titanium Round Target

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    • Item name: Gr2,3,4,5 Ti Target
    • Standard: ASTM B348
    • Specification: Dia63*32mm,or any sizes customerized
    • Application: Coating
    • Surface: Bright Polished
    • Processing: Forged
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  • sputtering targets

    sputtering targets

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    • Rest of Targets: Carbides・Florides・Nitraides)
    • TCO: ITO(In2O3:SnO2)・AZO(ZnO:Al2O3)

    HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics and specialty inorganic thin film PVD chemicals for a variety of target configurations. Forms include standard geometries likeCircular (2”~12”Dia), rectangular, cylindrical type, and rotary as well as custom designs for specialized processes.Target backing plateswith customised sizes and configurations can be provided with wide variety of materials including copper, aluminium, molybdenum and stainless steel.

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  • sputtering targets

    sputtering targets

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    1 Piece (MOQ)

    • Type: Sputtering Target
    • Material: Aluminum, Copper, Metal, Titanium, Cr, special materials
    • Shape: Round
    • Color: Gold, Sliver
    • Purity: 99%, 99.9999
    • Feature: Easy To Use, Long Life, Strong Structure, Sturdiness
    • Finishing: Non Polished, Polished
    • Packaging Type: Box, Vaccum Bag

    All Types  and sizes of Sputtering Targets. Price on enquiry. Purity up to 99.9999. 

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  • Sputtering Target

    Sputtering Target

    5,000 Per Piece

    1 Piece(s) (MOQ)

    • Type: Sputtering Target
    • Material: Aluminum, Copper, Metal, Titanium, All metals
    • Shape: Round, Rectangular
    • Purity: 99%, 99.99%
    • Feature: Strong Structure
    • Finishing: Non Polished, Polished
    • Packaging Type: Vaccum Bag

    high purity metal, alloy, ceramic, semiconductor and other customized sputter and pulsed laser deposition targets. Sputter targets are available with and without copper backing plate as required.targets can be customized in any dimensions.

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  • Alumina Sputtering Target

    Alumina Sputtering Target

    1 - 2 Per Pack

    01 Pack(s) (MOQ)

    • Type: Sputtering Target
    • Material: Aluminum
    • Shape: Round
    • Color: Gold, Gray, Sliver, White
    • Feature: Easy To Use, Long Life, Strong Structure, Sturdiness
    • Finishing: Non Polished, Polished
    • Packaging Type: Box, Carton, Plastic Bag, Vaccum Bag
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  • Sputtering Target

    Sputtering Target

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    1 Number (MOQ)

    • Purity: 99.99%
    • Shape: Round
    • Material: Metal 
    • Finishing: Polished
    • Diameter: 50mm
    • Pack Type: Vaccum Bag
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  • sputtering targets

    sputtering targets

    10,000 Per Piece

    1 Piece (MOQ)

    • Shape: Round
    • Features: Strong structure ,Easy to use, Longer life ,Compact design , Perfect finish.
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  • sputtering targets

    sputtering targets

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    • Purity: 99.99%
    • Shape: round
    • Melting Point: 3140 degree
    • Diameter: 50 mm
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  • Sputtering Target

    Sputtering Target

    17,000 Per Units

    100 Units (MOQ)

    • Features: Sturdiness, High effectiveness, Rust resistance.
    • Item Code: NPT-WT-2
    • Purity ranges: 99.9% to 99.999%
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    Nanopar Tech
    Manimajra
    0.0 View Profile
  • sputtering targets

    sputtering targets

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    We supply sputtering targets which is manufactured under show unparalleled outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure. The popular geometries featuring with both planar and rotatable shapes, such as circular, rectangular, ring, tube, cylinder and conicity, are all available. If you have your own unique requirements about the sputtering targets, no matter in density, purity, homogeneity or in geometry, please let us know exactly what you need. We'll do our utmost to meet your requirements precisely.

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  • Metal and Alloy Sputtering Targets

    Metal and Alloy Sputtering Targets

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    Shape: Ingot, Plate, Foil, Sheet, Disc, Ring, Rod, Wire, Tube, Granule, Pellet, Shots etc. Aluminum (Al) Target, Antimony (Sb) Target, Silver (Ag) Target Gold (Au) Target, Cerium (Ce) Target, Cobalt (Co) Target Carbon (C) Target, Chromium (Cr) Target, Copper (Cu) Target Cadmium (Cd) Target, Dysprosium (Dy) Target, Erbium(Er) Target Gadolinium (Gd) Target, Germanium (Ge) Target, Holmium (Ho) Target Hafnium (Hf) Target, Indium (In) Target, Iridium (Ir) Target Iron (Fe) Target, Lanthanum (La) Target, Lutetium (Lu) Target Lead (Pb) Target, Magnesium (Mg) Target, Molybdenum (Mo) Target Niobium (Nb) Target, Neodymium (Nd) Target, Nickel (Ni) Target Praseodymium (Pr) Target, Platinum (Pt) Target, Rhenium (Re) Target Ruthenium (Ru) Target, Scandium (Sc) Target, Silicon (Si) Target Samarium(Sm) Target, Tantalum (Ta) Target, Terbium (Tb) Target Titanium (Ti) Target, Thulium(Tm) Target, Tin (Sn) Target Vanadium (V) Target, Tungsten (W) Target, Ytterbium (Yb) Target Yttrium (Y) Target, Zirconium (Zr) Target, Zinc (Zn) Target

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  • sputtering targets

    sputtering targets

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    HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics...

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